Numerical Modeling of Electron Trajectories in EBE Systems

The Problem

Numerical modeling work applied to electron beam evaporation systems in order to improve beam directionality, electromagnetic control, and process performance for thin-film deposition.

How We Solved It

Electron trajectories were modeled in Wolfram Mathematica by solving motion equations under Lorentz force with electrostatic acceleration and magnetic deflection conditions.

Key Results

• Collision-free transit time under modeled conditions.
• Optimal field configuration: E = 6.7×10^4 V/m; B = 5 mT.
• Alignment between simulation outputs and experimental reference behavior.